Senior Lecturer
- Locations
- Lab 426
Room 315
- Phone numbers
- 7787 (Office)
64 3 479 7787 (Office Direct Dial)
4600 (Lab)
- sam.lowrey@otago.ac.nz
- Research Group
- https://blogs.otago.ac.nz/thermodynamics
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Biography
I carried out my undergraduate and postgraduate studies in physics at the University of Otago and completed my PhD in 2012. I then carried out a research fellow position at Otago working on the development of an optical lithographic system for large area imaging in the evanescent wave regime. During 2016-2021, I led several industry and government funded projects in the areas of engineering thermodynamics and open surface microfluidics. I joined the Department of Physics as a senior lecturer in October 2021.Engineering Thermodynamics – computational fluid dynamics modelling and performance testing of novel heat exchanger technology. Design, development and performance testing of energy efficient heat pump technology configured for drying processes.
Optical Lithography – development of advanced interference based optical lithographic imaging techniques for nanofabrication. Specific areas include high and ultra-high NA lithography using liquid-immersion and solid-immersion techniques.
Publications
Lowrey, S. C. D., & Blaikie, R. J. (2017). Optical lithography in the ultra high-NA regime using novel solid immersion media. Proceedings of the 8th International Conference on Advanced Materials and Nanotechnology (AMN8). (pp. 363). Retrieved from http://confer.co.nz/amn8/ Conference Contribution - Published proceedings: Abstract
Lowrey, S., & Sun, Z. (2015). A numerical model for a wet air-side economiser. International Journal of Refrigeration, 60, 38-53. doi: 10.1016/j.ijrefrig.2015.07.005 Journal - Research Article
Lowrey, S., & Blaikie, R. J. (2015). Solid immersion optical lithography: Tuning the prism/sample interface for improved ultra high-NA, high aspect ratio resist patterns over large exposure fields. Proceedings of SPIE (Vol. 9423): Alternative Lithographic Technologies VII. 94231W. doi: 10.1117/12.2175627 Conference Contribution - Published proceedings: Full paper
Lowrey, S., Bourke, L., Ding, B., & Blaikie, R. (2014). Ultrahigh NA, high aspect ratio interference lithography with resonant dielectric underlayers. Journal of Vacuum Science & Technology B: Microelectronics & Nanometer Structures, 32(6), 06FE01. doi: 10.1116/1.4894168 Journal - Research Article